IEEE - Institute of Electrical and Electronics Engineers, Inc. - Spectroscopic ellipsometry (SE) based real-time control of CF/sub 4//O/sub 2/ plasma etching of silicon nitride

Proceedings of 2000 American Control Conference (ACC 2000)

Author(s): Fidan, B. ; Parent, T. ; Rosen, G. ; Madhukar, A.
Publisher: IEEE - Institute of Electrical and Electronics Engineers, Inc.
Publication Date: 1 January 2000
Conference Location: Chicago, IL, USA
Conference Date: 28 June 2000
Volume: 6
ISBN (Paper): 0-7803-5519-9
ISSN (Paper): 0743-1619
DOI: 10.1109/ACC.2000.876974
Regular:

Real time feedback controllers for the electron cyclotron resonance CF/sub 4//O/sub 2/ plasma etching of plasma enhanced chemical vapor deposited silicon nitride thin films are designed and... View More

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