IEEE - Institute of Electrical and Electronics Engineers, Inc. - Application of organic silicon cluster to patter transfer process for deep UV lithography

Digest of Papers Microprocesses and Nanotechnology 2000. 2000 International Microprocesses and Nanotechnology Conference

Author(s): Y. Sato ; E. Shiobara ; J. Abe ; Y. Onishi ; Y. Nakano ; S. Hayase
Sponsor(s): Japan Soc. Appl. Phys.
Publisher: IEEE - Institute of Electrical and Electronics Engineers, Inc.
Publication Date: 1 January 2000
Conference Location: Tokyo, Japan, Japan
Conference Date: 11 July 2000
Page Count: 2
Page(s): 300 - 301
ISBN (Paper): 4-89114-004-6
DOI: 10.1109/IMNC.2000.872775
Regular:

In this paper, organic silicon cluster is investigated as bottom anti-reflective coating (BARC) material compatible with the RIE mask for the substrate(oxide) etch in a thin resist process for... View More

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