IEEE - Institute of Electrical and Electronics Engineers, Inc. - Chemically amplified electron beam positive resist with acetal protecting group-effect of the additives on resist properties

Digest of Papers Microprocesses and Nanotechnology 2000. 2000 International Microprocesses and Nanotechnology Conference

Author(s): Saito, S. ; Kihara, N. ; Ushirogouchi, T.
Publisher: IEEE - Institute of Electrical and Electronics Engineers, Inc.
Publication Date: 1 January 2000
Conference Location: Tokyo, Japan, Japan
Conference Date: 11 July 2000
Page(s): 290 - 291
ISBN (Paper): 4-89114-004-6
DOI: 10.1109/IMNC.2000.872768
Regular:

We discuss a high-sensitivity electron beam (EB) positive resist based on acetal-protected poly(hydroxystyrene) (PHS) and also propose a new chemical amplification system. In this system,... View More

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