IEEE - Institute of Electrical and Electronics Engineers, Inc. - Low-stress molybdenum/silicon multilayer coatings for extreme ultraviolet lithography

Digest of Papers Microprocesses and Nanotechnology 2000. 2000 International Microprocesses and Nanotechnology Conference

Author(s): Shiraishi, M. ; Ishiyama, W. ; Oshino, T. ; Murakami, K.
Publisher: IEEE - Institute of Electrical and Electronics Engineers, Inc.
Publication Date: 1 January 2000
Conference Location: Tokyo, Japan, Japan
Conference Date: 11 July 2000
Page(s): 286 - 287
ISBN (Paper): 4-89114-004-6
DOI: 10.1109/IMNC.2000.872766
Regular:

We greatly reduced the stress of Mo/Si multilayers deposited by ion beam sputtering from about -450 MPa to about +14 MPa by combining the methods of sub-multilayering and ion-beam polishing of... View More

Advertisement