IEEE - Institute of Electrical and Electronics Engineers, Inc. - Current status of EUV optics and future advancements in optical components

Digest of Papers Microprocesses and Nanotechnology 2000. 2000 International Microprocesses and Nanotechnology Conference

Author(s): D. Sweeney
Sponsor(s): Japan Soc. Appl. Phys.
Publisher: IEEE - Institute of Electrical and Electronics Engineers, Inc.
Publication Date: 1 January 2000
Conference Location: Tokyo, Japan, Japan
Conference Date: 11 July 2000
Page Count: 2
Page(s): 280 - 281
ISBN (Paper): 4-89114-004-6
DOI: 10.1109/IMNC.2000.872763
Regular:

An essential component for the success of extreme ultraviolet lithography is realization of an all-reflective optical imaging system with a total wavefront error approaching 0.25 nm rms and total... View More

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