IEEE - Institute of Electrical and Electronics Engineers, Inc. - Optics for EUV lithography

Digest of Papers Microprocesses and Nanotechnology 2000. 2000 International Microprocesses and Nanotechnology Conference

Author(s): P. Kurz ; H.-J. Mann ; M. Antoni ; W. Singer ; M. Muhlbeyer ; F. Melzer ; U. Dinger ; M. Weiser ; S. Stacklies ; G. Seitz ; F. Haidl ; E. Sohmen ; W. Kaiser
Sponsor(s): Japan Soc. Appl. Phys.
Publisher: IEEE - Institute of Electrical and Electronics Engineers, Inc.
Publication Date: 1 January 2000
Conference Location: Tokyo, Japan, Japan
Conference Date: 11 July 2000
Page Count: 1
ISBN (Paper): 4-89114-004-6
DOI: 10.1109/IMNC.2000.872750
Regular:

Extreme Ultraviolet Lithography (EUVL), using 13 nm radiation, has a high probability to become the Next Generation Lithography of choice for resolutions of 50 nm and below. The work at CARL ZEISS... View More

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