IEEE - Institute of Electrical and Electronics Engineers, Inc. - Sub-10 nm linewidth and overlay performance achieved with a fine-tuned EBPG-5000 TFE electron beam lithography system

Digest of Papers Microprocesses and Nanotechnology 2000. 2000 International Microprocesses and Nanotechnology Conference

Author(s): B.E. Maile ; W. Henschel ; H. Kurz ; B. Rienks ; R. Polman ; P. Kaars
Sponsor(s): Japan Soc. Appl. Phys.
Publisher: IEEE - Institute of Electrical and Electronics Engineers, Inc.
Publication Date: 1 January 2000
Conference Location: Tokyo, Japan, Japan
Conference Date: 11 July 2000
Page Count: 2
Page(s): 254 - 255
ISBN (Paper): 4-89114-004-6
DOI: 10.1109/IMNC.2000.872743
Regular:

For advanced nanoelectronic device concepts bridging the extended CMOS-world with the ultimate solution of single electron transistors (SETs), reliable lithography in the 10 nm (decanometer)... View More

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