IEEE - Institute of Electrical and Electronics Engineers, Inc. - AFM lithography combined with optical lithography

Digest of Papers Microprocesses and Nanotechnology 2000. 2000 International Microprocesses and Nanotechnology Conference

Author(s): M. Ishibashi ; S. Heike ; T. Hashizume
Sponsor(s): Japan Soc. Appl. Phys.
Publisher: IEEE - Institute of Electrical and Electronics Engineers, Inc.
Publication Date: 1 January 2000
Conference Location: Tokyo, Japan, Japan
Conference Date: 11 July 2000
Page Count: 2
Page(s): 192 - 193
ISBN (Paper): 4-89114-004-6
DOI: 10.1109/IMNC.2000.872701
Regular:

Reports on a hybrid method of AFM lithography and optical lithography that increases the drawing speed and decreases the drawing length. Advanced devices, such as quantum ones, have both... View More

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