IEEE - Institute of Electrical and Electronics Engineers, Inc. - 10 nm size fabrication of semiconductor substrates and metal thin lines by conventional photolithography

Digest of Papers Microprocesses and Nanotechnology 2000. 2000 International Microprocesses and Nanotechnology Conference

Author(s): S. Hashioka ; H. Matsumura
Sponsor(s): Japan Soc. Appl. Phys.
Publisher: IEEE - Institute of Electrical and Electronics Engineers, Inc.
Publication Date: 1 January 2000
Conference Location: Tokyo, Japan, Japan
Conference Date: 11 July 2000
Page Count: 2
Page(s): 184 - 185
ISBN (Paper): 4-89114-004-6
DOI: 10.1109/IMNC.2000.872695
Regular:

The novel nano-technology is required for realizing the nano-scale devices such as single electron transistor (SET) and metal/insulator tunnel transistor (MITT). Recently, new methods to fabricate... View More

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