IEEE - Institute of Electrical and Electronics Engineers, Inc. - Proposal of atom lithography for silicon quantum dots

Digest of Papers Microprocesses and Nanotechnology 2000. 2000 International Microprocesses and Nanotechnology Conference

Author(s): Y. Asakawa ; H. Kumagai ; M. Obara
Sponsor(s): Japan Soc. Appl. Phys.
Publisher: IEEE - Institute of Electrical and Electronics Engineers, Inc.
Publication Date: 1 January 2000
Conference Location: Tokyo, Japan, Japan
Conference Date: 11 July 2000
Page Count: 2
Page(s): 168 - 169
ISBN (Paper): 4-89114-004-6
DOI: 10.1109/IMNC.2000.872683
Regular:

Recently so called "atom lithography", which makes the most use of atom deposition techniques with an optical mask, has been studied. This technique has been enable to fabricate nanometer-size... View More

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