IEEE - Institute of Electrical and Electronics Engineers, Inc. - A 100-kV, 100-A/cm/sup 2/ electron optical system for the EB-X3 X-ray mask writer

Digest of Papers Microprocesses and Nanotechnology 2000. 2000 International Microprocesses and Nanotechnology Conference

Author(s): K. Saito ; J. Kato ; T. Matsuda ; Y. Nakayama
Sponsor(s): Japan Soc. Appl. Phys.
Publisher: IEEE - Institute of Electrical and Electronics Engineers, Inc.
Publication Date: 1 January 2000
Conference Location: Tokyo, Japan, Japan
Conference Date: 11 July 2000
Page Count: 2
Page(s): 166 - 167
ISBN (Paper): 4-89114-004-6
DOI: 10.1109/IMNC.2000.872682
Regular:

In order to fabricate high-quality x-ray masks, we developed the EB-X3, a variably shaped electron beam writing system (beam voltage:100 kV; current density:50 PJcm/sup 2/; patterning... View More

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