IEEE - Institute of Electrical and Electronics Engineers, Inc. - Influence of electron density distribution at the electron source in a projection exposure system

Digest of Papers Microprocesses and Nanotechnology 2000. 2000 International Microprocesses and Nanotechnology Conference

Author(s): M. Kotera ; M. Sakai ; I. Shimizu ; Y. Tomo ; A. Yoshida ; Y. Kojima ; M. Yamabe
Sponsor(s): Japan Soc. Appl. Phys.
Publisher: IEEE - Institute of Electrical and Electronics Engineers, Inc.
Publication Date: 1 January 2000
Conference Location: Tokyo, Japan, Japan
Conference Date: 11 July 2000
Page Count: 2
Page(s): 140 - 141
ISBN (Paper): 4-89114-004-6
DOI: 10.1109/IMNC.2000.872662
Regular:

The exposure characteristics are largely influenced by the size of the electron source. The characteristics are also influenced by the electron density distribution at the source. In order to... View More

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