IEEE - Institute of Electrical and Electronics Engineers, Inc. - Simulation of electron and ion beam optics for high throughput lithography

Digest of Papers Microprocesses and Nanotechnology 2000. 2000 International Microprocesses and Nanotechnology Conference

Author(s): X. Zhu ; H. Liu ; E. Munro ; J. Rouse
Sponsor(s): Japan Soc. Appl. Phys.
Publisher: IEEE - Institute of Electrical and Electronics Engineers, Inc.
Publication Date: 1 January 2000
Conference Location: Tokyo, Japan, Japan
Conference Date: 11 July 2000
Page Count: 2
Page(s): 134 - 135
ISBN (Paper): 4-89114-004-6
DOI: 10.1109/IMNC.2000.872658
Regular:

Several electron and ion beam systems are currently being developed as possible candidates for high-throughput next generation lithography ("NGL"). These include projection electron beam columns... View More

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