IEEE - Institute of Electrical and Electronics Engineers, Inc. - Critical dimension issues for 200 mm electron projection masks

Digest of Papers Microprocesses and Nanotechnology 2000. 2000 International Microprocesses and Nanotechnology Conference

Author(s): D.J. Resnick ; K. Nordquist ; W.J. Dauksher ; E. Ainley ; B. Lu ; P. Mangat ; E. Weisbrod ; C. Martin ; A. Wei ; R. Englestad ; E. Lovell ; V. Ivin
Sponsor(s): Japan Soc. Appl. Phys.
Publisher: IEEE - Institute of Electrical and Electronics Engineers, Inc.
Publication Date: 1 January 2000
Conference Location: Tokyo, Japan, Japan
Conference Date: 11 July 2000
Page Count: 2
Page(s): 120 - 121
ISBN (Paper): 4-89114-004-6
DOI: 10.1109/IMNC.2000.872652
Regular:

Electron projection lithography (EPL) is one possible successor to conventional optical lithography. One type of EPL mask, namely a SCALPEL mask, consists of a large array of rectangular membranes... View More

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