IEEE - Institute of Electrical and Electronics Engineers, Inc. - EB stepper. A high throughput E-beam projection lithography system

Digest of Papers Microprocesses and Nanotechnology 2000. 2000 International Microprocesses and Nanotechnology Conference

Author(s): T. Yamaguchi
Sponsor(s): Japan Soc. Appl. Phys.
Publisher: IEEE - Institute of Electrical and Electronics Engineers, Inc.
Publication Date: 1 January 2000
Conference Location: Tokyo, Japan, Japan
Conference Date: 11 July 2000
Page Count: 2
Page(s): 116 - 117
ISBN (Paper): 4-89114-004-6
DOI: 10.1109/IMNC.2000.872650
Regular:

The author reviews progress in electron beam projection lithography. He discusses the management of 250 /spl mu/m sub-field distortion correction and EB tool design.

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