IEEE - Institute of Electrical and Electronics Engineers, Inc. - Feasibility of new ARC using PECVD for both KrF and ArF lithography

Digest of Papers Microprocesses and Nanotechnology 2000. 2000 International Microprocesses and Nanotechnology Conference

Author(s): Yongbeom Kim ; Junghyeon Lee ; Hanku Cho ; Jootae Moon
Publisher: IEEE - Institute of Electrical and Electronics Engineers, Inc.
Publication Date: 1 January 2000
Conference Location: Tokyo, Japan, Japan
Conference Date: 11 July 2000
Page(s): 106 - 107
ISBN (Paper): 4-89114-004-6
DOI: 10.1109/IMNC.2000.872645
Regular:

We developed and confirmed the feasibility of a new carbon ARC (CARC) for both KrF and ArF lithography. CARC has high conformability on topography and is easily removable during the resist... View More

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