IEEE - Institute of Electrical and Electronics Engineers, Inc. - Capability of 70 nm pattern replication in x-ray lithography

Digest of Papers Microprocesses and Nanotechnology 2000. 2000 International Microprocesses and Nanotechnology Conference

Author(s): Kikuchi, Y. ; Hasegawa, M. ; Iwamoto, T. ; Fujii, K. ; Matsui, Y.
Publisher: IEEE - Institute of Electrical and Electronics Engineers, Inc.
Publication Date: 1 January 2000
Conference Location: Tokyo, Japan, Japan
Conference Date: 11 July 2000
Page(s): 60 - 61
ISBN (Paper): 4-89114-004-6
DOI: 10.1109/IMNC.2000.872622
Regular:

It has been shown that the Proximity X-ray Lithography (PXL) is the most mature technology among Next Generation Lithography (NGL) options at 100 nm node. As the basic resolution of PXL is defined... View More

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