IEEE - Institute of Electrical and Electronics Engineers, Inc. - A new cleaning technique for x-ray masks in alkaline solutions by control of surface potential

Digest of Papers Microprocesses and Nanotechnology 2000. 2000 International Microprocesses and Nanotechnology Conference

Author(s): Tuda, M. ; Kinugawa, M. ; Ootera, H. ; Marumoto, K.
Publisher: IEEE - Institute of Electrical and Electronics Engineers, Inc.
Publication Date: 1 January 2000
Conference Location: Tokyo, Japan, Japan
Conference Date: 11 July 2000
Page(s): 54 - 55
ISBN (Paper): 4-89114-004-6
DOI: 10.1109/IMNC.2000.872619
Regular:

This paper presents an electrochemical surface cleaning (ECSC) technique for x-ray masks employing amorphous WN/sub x/ absorbers. The electrostatic surface potential of the mask in alkaline... View More

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