IEEE - Institute of Electrical and Electronics Engineers, Inc. - Deposition and characterization of Ta, TaN/sub x/, and Ta/sub 4/B films for NGL mask application

Digest of Papers Microprocesses and Nanotechnology 2000. 2000 International Microprocesses and Nanotechnology Conference

Author(s): Seung Yoon Lee ; Chang Mo Park ; Jinho Ahn
Sponsor(s): Japan Soc. Appl. Phys.
Publisher: IEEE - Institute of Electrical and Electronics Engineers, Inc.
Publication Date: 1 January 2000
Conference Location: Tokyo, Japan, Japan
Conference Date: 11 July 2000
Page Count: 2
Page(s): 52 - 53
ISBN (Paper): 4-89114-004-6
DOI: 10.1109/IMNC.2000.872618
Regular:

Next generation lithography (NGL) masks are mainly divided into three categories by pattern transfer method - reflective type, membrane type and stencil type. Among these types of masks, the... View More

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