IEEE - Institute of Electrical and Electronics Engineers, Inc. - Hierarchical optical proximity correction on contact hole layers

Digest of Papers Microprocesses and Nanotechnology 2000. 2000 International Microprocesses and Nanotechnology Conference

Author(s): K. Yamamoto ; S. Kobayashi ; T. Uno ; T. Kotani ; S. Tanaka ; S. Inoue ; S. Watanabe ; H. Higurashi
Sponsor(s): Japan Soc. Appl. Phys.
Publisher: IEEE - Institute of Electrical and Electronics Engineers, Inc.
Publication Date: 1 January 2000
Conference Location: Tokyo, Japan, Japan
Conference Date: 11 July 2000
Page Count: 2
Page(s): 40 - 41
ISBN (Paper): 4-89114-004-6
DOI: 10.1109/IMNC.2000.872612
Regular:

As the size of contact holes shrinks below 0.2 /spl mu/m, optical proximity correction (OPC) on contact hole layers becomes essential. When correcting contact holes, 1-dimensional correction is... View More

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