IEEE - Institute of Electrical and Electronics Engineers, Inc. - Development of EUV reflectometer using a laser-plasma x-ray source

Digest of Papers Microprocesses and Nanotechnology 2000. 2000 International Microprocesses and Nanotechnology Conference

Author(s): H. Kondo ; N. Kandaka ; K. Sugisaki ; T. Oshino ; M. Shiraishi ; W. Ishiyama ; K. Murakami
Sponsor(s): Japan Soc. Appl. Phys.
Publisher: IEEE - Institute of Electrical and Electronics Engineers, Inc.
Publication Date: 1 January 2000
Conference Location: Tokyo, Japan, Japan
Conference Date: 11 July 2000
Page Count: 1
ISBN (Paper): 4-89114-004-6
DOI: 10.1109/IMNC.2000.872609
Regular:

Summary form only given, as follows. In order to improve the performance of multilayer optics, it is necessary to use various measuring tools to evaluate their properties. Reflectometer is a... View More

Advertisement