IEEE - Institute of Electrical and Electronics Engineers, Inc. - Theoretical MEF calculation for periodic patterns

Digest of Papers Microprocesses and Nanotechnology 2000. 2000 International Microprocesses and Nanotechnology Conference

Author(s): T. Terasawa ; N. Hasegawa
Sponsor(s): Japan Soc. Appl. Phys.
Publisher: IEEE - Institute of Electrical and Electronics Engineers, Inc.
Publication Date: 1 January 2000
Conference Location: Tokyo, Japan, Japan
Conference Date: 11 July 2000
Page Count: 2
Page(s): 16 - 17
ISBN (Paper): 4-89114-004-6
DOI: 10.1109/IMNC.2000.872602
Regular:

Current reduction projection exposure tools with a large numerical aperture lens can fabricate fine features with smaller than exposure wavelength using several resolution enhancement techniques.... View More

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