IEEE - Institute of Electrical and Electronics Engineers, Inc. - Highly accurate and precise measurement technique for effective exposure dose

Digest of Papers Microprocesses and Nanotechnology 2000. 2000 International Microprocesses and Nanotechnology Conference

Author(s): K. Izuha ; T. Fujisawa ; M. Asano ; S. Inoue
Sponsor(s): Japan Soc. Appl. Phys.
Publisher: IEEE - Institute of Electrical and Electronics Engineers, Inc.
Publication Date: 1 January 2000
Conference Location: Tokyo, Japan, Japan
Conference Date: 11 July 2000
Page Count: 2
Page(s): 8 - 9
ISBN (Paper): 4-89114-004-6
DOI: 10.1109/IMNC.2000.872598
Regular:

The recent advantage of a measurement technique for effective exposure dose (EED), which is performed by monitoring the residual thickness of the photoresist, has enabled us to elucidate errors... View More

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