IEEE - Institute of Electrical and Electronics Engineers, Inc. - Plasma-induced charging damage of a ferroelectric capacitor during interconnect metal etch

2000 5th International Symposium on Plasma Process-Induced Damage

Author(s): Shin Seung Park ; Chang Ju Choi ; Jin Woong Kim ; Jeong Mo Hwang
Publisher: IEEE - Institute of Electrical and Electronics Engineers, Inc.
Publication Date: 1 January 2000
Conference Location: Santa Clara, CA, USA, USA
Conference Date: 22 May 2000
Page(s): 145 - 148
ISBN (Paper): 0-9651577-4-1
DOI: 10.1109/PPID.2000.870648
Regular:

Plasma-induced charging damage of a SrBi/sub 2/Ta/sub 2/O/sub 9/ (SBT) ferroelectric capacitor has been investigated during interconnect metal etch in fabrication of ferroelectric random access... View More

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