IEEE - Institute of Electrical and Electronics Engineers, Inc. - Pattern-size effect on electron shading

2000 5th International Symposium on Plasma Process-Induced Damage

Author(s): Mise, N. ; Usui, T. ; Tanaka, J. ; Nojiri, K. ; Ono, T.
Publisher: IEEE - Institute of Electrical and Electronics Engineers, Inc.
Publication Date: 1 January 2000
Conference Location: Santa Clara, CA, USA, USA
Conference Date: 22 May 2000
Page(s): 46 - 49
ISBN (Paper): 0-9651577-4-1
DOI: 10.1109/PPID.2000.870592
Regular:

The effect of pattern size on electron shading over a line-and-space photoresist pattern on a MOS capacitor was determined by a numerical simulation. It was found that it takes longer for the... View More

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