IEEE - Institute of Electrical and Electronics Engineers, Inc. - Critical dimension management of photo resister by lens heating compensation and statistical process control

2000 5th International Workshop on Statistical Metrology

Author(s): Young, C.D. ; Leu, R.J. ; Hung, C.C. ; Chen, S.F. ; Huang, K.W.
Publisher: IEEE - Institute of Electrical and Electronics Engineers, Inc.
Publication Date: 1 January 2000
Conference Location: Honolulu, HI, USA, USA
Conference Date: 10 June 2000
Page(s): 23 - 26
ISBN (Paper): 0-7803-5896-1
DOI: 10.1109/IWSTM.2000.869303
Regular:

Critical dimension (CD) control of each photolithography and etching layer of the electronic devices plays an important role in creating the reliable and high yielding integrated circuits (ICs)... View More

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