IEEE - Institute of Electrical and Electronics Engineers, Inc. - Instabilities in low pressure inductive discharges with attaching gases

ICOPS 2000. IEEE Conference Record - Abstracts. 27th IEEE International Conference on Plasma Science

Author(s): Lieberman, M.A. ; Lichtenberg, A.J. ; Marakhtanov, A.M. ; Chabert, P. ; Tuszcwski, M.
Publisher: IEEE - Institute of Electrical and Electronics Engineers, Inc.
Publication Date: 1 January 2000
Conference Location: New Orleans, LA, USA, USA
Conference Date: 4 June 2000
ISBN (Paper): 0-7803-5982-8
ISSN (Paper): 0730-9244
DOI: 10.1109/PLASMA.2000.855052
Regular:

Summary form only given, as follows. Plasma instabilities have been observed in low pressure inductive processing discharges with attaching gases. For SF/sub 6/, instability windows in pressure... View More

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