IEEE - Institute of Electrical and Electronics Engineers, Inc. - Long-pulse plasma immersion ion implantation using a grounded conduction grid

ICOPS 2000. IEEE Conference Record - Abstracts. 27th IEEE International Conference on Plasma Science

Author(s): Xuchu Zeng ; Kowk, T.T.K. ; Xiubo Tian ; Chung Chan ; Chu, P.K.
Publisher: IEEE - Institute of Electrical and Electronics Engineers, Inc.
Publication Date: 1 January 2000
Conference Location: New Orleans, LA, USA, USA
Conference Date: 4 June 2000
ISBN (Paper): 0-7803-5982-8
ISSN (Paper): 0730-9244
DOI: 10.1109/PLASMA.2000.855023
Regular:

Summary form only given, as follows. The use of a grounded conducting grid positioned between the plasma source and sample chuck has been shown theoretically to allow direct current (DC) plasma... View More

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