IEEE - Institute of Electrical and Electronics Engineers, Inc. - Pulsed ICP plasma generation and characterization

ICOPS 2000. IEEE Conference Record - Abstracts. 27th IEEE International Conference on Plasma Science

Author(s): Wei Guo ; DeJoseph, C.A., Jr.
Publisher: IEEE - Institute of Electrical and Electronics Engineers, Inc.
Publication Date: 1 January 2000
Conference Location: New Orleans, LA, USA, USA
Conference Date: 4 June 2000
ISBN (Paper): 0-7803-5982-8
ISSN (Paper): 0730-9244
DOI: 10.1109/PLASMA.2000.854991
Regular:

Summary form only given, as follows. Modulated rf power at 13.56 MHz has been applied to a planar coil to generate pulsed, low pressure, inductively coupled argon plasmas (ICP). The modulation is... View More

Advertisement