IEEE - Institute of Electrical and Electronics Engineers, Inc. - Plasma diagnostic measurements of argon-hydrogen-methane discharges used for ultra-nanocrystalline diamond deposition in a microwave CVD system

ICOPS 2000. IEEE Conference Record - Abstracts. 27th IEEE International Conference on Plasma Science

Author(s): Huang, W.S. ; Grotjohn, T.A. ; Asmussen, J.
Publisher: IEEE - Institute of Electrical and Electronics Engineers, Inc.
Publication Date: 1 January 2000
Conference Location: New Orleans, LA, USA, USA
Conference Date: 4 June 2000
ISBN (Paper): 0-7803-5982-8
ISSN (Paper): 0730-9244
DOI: 10.1109/PLASMA.2000.854915
Regular:

Summary form only given, as follows. Argon-methane and argon-methane-hydrogen discharges used in a microwave CVD system for the deposition of diamond films are investigated in this study.... View More

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