IEEE - Institute of Electrical and Electronics Engineers, Inc. - The effect of static magnetic field configuration on the ion production efficiency and operational stability of a microwave plasma source

ICOPS 2000. IEEE Conference Record - Abstracts. 27th IEEE International Conference on Plasma Science

Author(s): Perrin, M. ; Grotjohn, T.A. ; Asmussen, J.
Publisher: IEEE - Institute of Electrical and Electronics Engineers, Inc.
Publication Date: 1 January 2000
Conference Location: New Orleans, LA, USA, USA
Conference Date: 4 June 2000
ISBN (Paper): 0-7803-5982-8
ISSN (Paper): 0730-9244
DOI: 10.1109/PLASMA.2000.854832
Regular:

Summary form only given. In the last five years interest has grown in non-magnetized, large area, low pressure microwave plasma sources. The advantages of eliminating costly, bulky, high power... View More

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