IEEE - Institute of Electrical and Electronics Engineers, Inc. - Large area plasma processing system based on electron beam ionization

ICOPS 2000. IEEE Conference Record - Abstracts. 27th IEEE International Conference on Plasma Science

Author(s): Leonhardt, D. ; Walton, S.G. ; Blackwell, D.B. ; Murphy, D.P. ; Fernsler, R.F. ; Meger, R.A.
Publisher: IEEE - Institute of Electrical and Electronics Engineers, Inc.
Publication Date: 1 January 2000
Conference Location: New Orleans, LA, USA, USA
Conference Date: 4 June 2000
ISBN (Paper): 0-7803-5982-8
ISSN (Paper): 0730-9244
DOI: 10.1109/PLASMA.2000.854828
Regular:

Summary form only given. Electron beam ionization is both efficient at producing plasma and scalable to large area (square meters) with beam energy and density. A 'Large Area Plasma Processing... View More

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