IEEE - Institute of Electrical and Electronics Engineers, Inc. - Experimental investigation of power deposition and ionization kinetics in an inductively coupled discharge

ICOPS 2000. IEEE Conference Record - Abstracts. 27th IEEE International Conference on Plasma Science

Author(s): Rullenraad, W. ; Crowley, B. ; Turner, M.M. ; Vender, D.
Publisher: IEEE - Institute of Electrical and Electronics Engineers, Inc.
Publication Date: 1 January 2000
Conference Location: New Orleans, LA, USA, USA
Conference Date: 4 June 2000
ISBN (Paper): 0-7803-5982-8
ISSN (Paper): 0730-9244
DOI: 10.1109/PLASMA.2000.854826
Regular:

Summary form only given. Inductively coupled discharges are of current interest because they may be applied to plasma processing, especially in the microelectronic device fabrication industry. The... View More

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