IEEE - Institute of Electrical and Electronics Engineers, Inc. - RF thermal plasma CVD of diamond: the role of acetylene in film morphology

ICOPS 2000. IEEE Conference Record - Abstracts. 27th IEEE International Conference on Plasma Science

Author(s): Larson, J.L. ; Iordanoglou, D.I. ; Girshick, S.L.
Publisher: IEEE - Institute of Electrical and Electronics Engineers, Inc.
Publication Date: 1 January 2000
Conference Location: New Orleans, LA, USA, USA
Conference Date: 4 June 2000
ISBN (Paper): 0-7803-5982-8
ISSN (Paper): 0730-9244
DOI: 10.1109/PLASMA.2000.854736
Regular:

Summary form only given. Diamond films produced by chemical vapor deposition (CVD) show faceting which is characterized by {100} or {111} surfaces. Many investigators have found that the... View More

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