IEEE - Institute of Electrical and Electronics Engineers, Inc. - Enthalpy and heat flux distributions in a triple torch plasma reactor

ICOPS 2000. IEEE Conference Record - Abstracts. 27th IEEE International Conference on Plasma Science

Author(s): Hyundae Kim ; Hancun Chen ; Heberlein, J.
Publisher: IEEE - Institute of Electrical and Electronics Engineers, Inc.
Publication Date: 1 January 2000
Conference Location: New Orleans, LA, USA, USA
Conference Date: 4 June 2000
ISBN (Paper): 0-7803-5982-8
ISSN (Paper): 0730-9244
DOI: 10.1109/PLASMA.2000.854734
Regular:

Summary form only given. In thermal plasma deposition, the precursor materials are injected into the plasma and transported by a plasma jet to the substrate. The strong non-uniformities of the... View More

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