IEEE - Institute of Electrical and Electronics Engineers, Inc. - Two-dimensional simulation of ion energy and angular distributions at the wafer in low-pressure RF discharges

ICOPS 2000. IEEE Conference Record - Abstracts. 27th IEEE International Conference on Plasma Science

Author(s): Hu, Y. ; Lin, T.L. ; Huang, C.Y.
Publisher: IEEE - Institute of Electrical and Electronics Engineers, Inc.
Publication Date: 1 January 2000
Conference Location: New Orleans, LA, USA, USA
Conference Date: 4 June 2000
ISBN (Paper): 0-7803-5982-8
ISSN (Paper): 0730-9244
DOI: 10.1109/PLASMA.2000.854722
Regular:

Summary form only given. We have developed a two-dimensional, electromagnetic, PIC-MCC code to study the ion energy and angular distributions in the RF biased sheaths. At the bulk-sheath boundary,... View More

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