IEEE - Institute of Electrical and Electronics Engineers, Inc. - Argon and air mixture plasmas produced by a radiofrequency plasma source

ICOPS 2000. IEEE Conference Record - Abstracts. 27th IEEE International Conference on Plasma Science

Author(s): Paller, E.S. ; Scharer, J.E. ; Kelly, K.L. ; Ding, C.
Publisher: IEEE - Institute of Electrical and Electronics Engineers, Inc.
Publication Date: 1 January 2000
Conference Location: New Orleans, LA, USA, USA
Conference Date: 4 June 2000
ISBN (Paper): 0-7803-5982-8
ISSN (Paper): 0730-9244
DOI: 10.1109/PLASMA.2000.854720
Regular:

Summary form only given. A radiofrequency helicon plasma source is used to study the creation and sustainment of a high density plasma of air constituents (N/sub 2/, Ar and O/sub 2/). Various... View More

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