IEEE - Institute of Electrical and Electronics Engineers, Inc. - Real-time feedback control of plasma density in inductively coupled plasmas

ICOPS 2000. IEEE Conference Record - Abstracts. 27th IEEE International Conference on Plasma Science

Author(s): Chang, C.H. ; Leou, K.C. ; Lin, C.
Publisher: IEEE - Institute of Electrical and Electronics Engineers, Inc.
Publication Date: 1 January 2000
Conference Location: New Orleans, LA, USA, USA
Conference Date: 4 June 2000
ISBN (Paper): 0-7803-5982-8
ISSN (Paper): 0730-9244
DOI: 10.1109/PLASMA.2000.854556
Regular:

Summary form only given. The real-time feedback control has the potential to enhance the process reliability of VLSI fabrication. Most of the studies on real-time feedback control of plasma... View More

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