IEEE - Institute of Electrical and Electronics Engineers, Inc. - A new hollow-cathode magnetron source for 0.10 /spl mu/m copper applications

Proceedings of the IEEE 2000 International Interconnect Technology Conference

Author(s): Ashtiani, K.A. ; Klawuhn, E. ; Hayden, D. ; Ow, M. ; Levy, K.B. ; Danek, M.
Publisher: IEEE - Institute of Electrical and Electronics Engineers, Inc.
Publication Date: 1 January 2000
Conference Location: Burlingame, CA, USA
Conference Date: 7 June 2000
Page(s): 37 - 39
ISBN (Paper): 0-7803-6327-2
DOI: 10.1109/IITC.2000.854274
Regular:

A new design Hollow-Cathode Magnetron (HCM) source was evaluated for 0.10 /spl mu/m copper (Cu) seed deposition applications. The new source included: (i) an external Dual Coil electromagnet for... View More

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