IEEE - Institute of Electrical and Electronics Engineers, Inc. - Mechanical and electrical characteristics of polysilicon film deposited by new LPCVD using lamp heating

MHS'99. Proceedings of the 1999 International Symposium on Micromechantronics and Human Science. Towards the New Century

Author(s): Ueda, T. ; Kuribayashi, K. ; Hasegawa, S.
Publisher: IEEE - Institute of Electrical and Electronics Engineers, Inc.
Publication Date: 1 January 1999
Conference Location: Nagoya, Japan, Japan
Conference Date: 23 November 1999
Page(s): 99 - 106
ISBN (Paper): 0-7803-5790-6
DOI: 10.1109/MHS.1999.819989
Regular:

The newly developed LPCVD apparatus using lamp heating was shown to be valid for obtaining the same polysilicon film for micromachines as that produced by the conventional LPCVD apparatus, by... View More

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