IEEE - Institute of Electrical and Electronics Engineers, Inc. - Study on fabrication of sub-micron structures for MEMS using deep X-ray lithography

MHS'99. Proceedings of the 1999 International Symposium on Micromechantronics and Human Science. Towards the New Century

Author(s): Ueno, H. ; Nishi, N. ; Sugiyama, S.
Publisher: IEEE - Institute of Electrical and Electronics Engineers, Inc.
Publication Date: 1 January 1999
Conference Location: Nagoya, Japan, Japan
Conference Date: 23 November 1999
Page(s): 87 - 92
ISBN (Paper): 0-7803-5790-6
DOI: 10.1109/MHS.1999.819987
Regular:

It is necessary for practical MEMS with high performance to be fabricated microstructures with sub-micron widths and gaps (lines and spaces). In sub-micron deep X-ray lithography, one of the most... View More

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