IEEE - Institute of Electrical and Electronics Engineers, Inc. - Effects of RF plasma processing on the impedance and electron emission characteristics of a MV beam diode

IEEE Conference Record - Abstracts. 1999 IEEE International Conference on Plasma Science. 26th International Conference

Author(s): Rintamaki, J.I. ; Gilgenbach, R.M. ; Cohen, W.E. ; Jaynes, R.L. ; Ang, L.K. ; Lau, Y.Y. ; Cuneo, M.E. ; Menge, P.R.
Publisher: IEEE - Institute of Electrical and Electronics Engineers, Inc.
Publication Date: 1 January 1999
Conference Location: Monterey, CA, USA, USA
Conference Date: 24 June 1999
ISBN (Paper): 0-7803-5224-6
ISSN (Paper): 0730-9244
DOI: 10.1109/PLASMA.1999.829622
Regular:

Summary form only given. Experiments have proven that both the surface contaminants and microstructure topography on the cathode of an electron beam diode influence impedance collapse and electron... View More

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