IEEE - Institute of Electrical and Electronics Engineers, Inc. - Study of pulsed HF discharge in N/sub 2//O/sub 2//NO for gas cleaning

IEEE Conference Record - Abstracts. 1999 IEEE International Conference on Plasma Science. 26th International Conference

Author(s): Baeva, M. ; Gier, H. ; Pott, A. ; Uhlenbusch, J.
Publisher: IEEE - Institute of Electrical and Electronics Engineers, Inc.
Publication Date: 1 January 1999
Conference Location: Monterey, CA, USA, USA
Conference Date: 24 June 1999
ISBN (Paper): 0-7803-5224-6
ISSN (Paper): 0730-9244
DOI: 10.1109/PLASMA.1999.829522
Regular:

Summary form only given. The aim of the study is the reduction of NO/sub x/ components in exhaust gases by means of a pulsed microwave discharge. discharge is operated in N/sub 2//O/sub 2//NO... View More

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