IEEE - Institute of Electrical and Electronics Engineers, Inc. - High voltage ionization during plasma immersion ion implantation

IEEE Conference Record - Abstracts. 1999 IEEE International Conference on Plasma Science. 26th International Conference

Author(s): Tian, X.B. ; Zeng, Z.M. ; Kwok, T.K. ; Tang, B.Y. ; Chu, P.K.
Publisher: IEEE - Institute of Electrical and Electronics Engineers, Inc.
Publication Date: 1 January 1999
Conference Location: Monterey, CA, USA, USA
Conference Date: 24 June 1999
ISBN (Paper): 0-7803-5224-6
ISSN (Paper): 0730-9244
DOI: 10.1109/PLASMA.1999.829496
Regular:

Summary form only given. During the plasma immersion ion implantation (PIII) process, ions are typically created by an external plasma source, such as electron impact glow discharge using hot... View More

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