IEEE - Institute of Electrical and Electronics Engineers, Inc. - Emissive probe characteristic in an inductive plasma source

IEEE Conference Record - Abstracts. 1999 IEEE International Conference on Plasma Science. 26th International Conference

Author(s): Lho, T. ; Hershkowitz, N. ; Kim, G.H. ; Steer, W.
Publisher: IEEE - Institute of Electrical and Electronics Engineers, Inc.
Publication Date: 1 January 1999
Conference Location: Monterey, CA, USA, USA
Conference Date: 24 June 1999
ISBN (Paper): 0-7803-5224-6
ISSN (Paper): 0730-9244
DOI: 10.1109/PLASMA.1999.829345
Regular:

Summary form only given. Two new features of a time averaged emissive probe characteristic have been studied in an inductive source. One is the effect of harmonics of the RF fluctuation. Without... View More

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