IEEE - Institute of Electrical and Electronics Engineers, Inc. - Applications of control and signal processing to the microlithographic process

IECON'99. Conference Proceedings. 25th Annual Conference of the IEEE Industrial Electronics Society

Author(s): Schaper, C.D. ; Kailath, T. ; El-Awady, K. ; Tay, A.
Publisher: IEEE - Institute of Electrical and Electronics Engineers, Inc.
Publication Date: 1 January 1999
Conference Location: San Jose, CA, USA, USA
Conference Date: 29 November 1999
Volume: 1
ISBN (Paper): 0-7803-5735-3
DOI: 10.1109/IECON.1999.822159
Regular:

An overview is given describing applications of multivariable control, signal processing, optimization, modeling and computation to the lithography sequence. We discuss areas in the patterning... View More

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