IEEE - Institute of Electrical and Electronics Engineers, Inc. - Photoresist mask design for evaluation of resist-mediated charging effects during high current ion implantation

1998 International Conference on Ion Implantation Technology. Proceedings. Ion Implantation Technology - 98

Author(s): Lukaszek, W. ; Current, M.
Publisher: IEEE - Institute of Electrical and Electronics Engineers, Inc.
Publication Date: 1 January 1999
Conference Location: Kyoto, Japan, Japan
Conference Date: 22 June 1998
Volume: 1
ISBN (Paper): 0-7803-4538-X
DOI: 10.1109/IIT.1999.812202
Regular:

Although the effects of photoresist on wafer charging during high current ion implantation have been previously reported, the resist layouts did not always simulate resist placement on product... View More

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