IEEE - Institute of Electrical and Electronics Engineers, Inc. - Investigation of energy purity of Sub-10 keV B/sup +/ implants on a Varian VIISion PLUS ion implanter

1998 International Conference on Ion Implantation Technology. Proceedings. Ion Implantation Technology - 98

Author(s): Todorov, S.S. ; Latona, G.B. ; Cummings, J.J. ; Kase, M.
Publisher: IEEE - Institute of Electrical and Electronics Engineers, Inc.
Publication Date: 1 January 1999
Conference Location: Kyoto, Japan, Japan
Conference Date: 22 June 1998
Volume: 1
ISBN (Paper): 0-7803-4538-X
DOI: 10.1109/IIT.1999.812200
Regular:

The continuing decrease in device dimensions places increasing requirements for production-worthy ion beam currents at energies suitable for the fabrication of shallow junctions. The use of... View More

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