IEEE - Institute of Electrical and Electronics Engineers, Inc. - Correlation of screen oxide thickness and iron levels introduced during batch high-current implants

1998 International Conference on Ion Implantation Technology. Proceedings. Ion Implantation Technology - 98

Author(s): Todorov, S.S. ; Bertuch, A.F. ; Polignano, M.L. ; Caputo, D.
Publisher: IEEE - Institute of Electrical and Electronics Engineers, Inc.
Publication Date: 1 January 1999
Conference Location: Kyoto, Japan, Japan
Conference Date: 22 June 1998
Volume: 1
ISBN (Paper): 0-7803-4538-X
DOI: 10.1109/IIT.1999.812199
Regular:

Iron is one of the most critical contaminants adversely affecting the performance of advanced microelectronic devices. The maximum tolerated Fe levels are becoming increasingly lower with... View More

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