IEEE - Institute of Electrical and Electronics Engineers, Inc. - Charge control in a ribbon beam high current ion implanter

1998 International Conference on Ion Implantation Technology. Proceedings. Ion Implantation Technology - 98

Author(s): Mehta, S. ; Walther, S.R. ; Che-Hoo Ng ; Angel, G. ; Weeman, J. ; Ukyo Jeong ; Piscitello, W.
Publisher: IEEE - Institute of Electrical and Electronics Engineers, Inc.
Publication Date: 1 January 1999
Conference Location: Kyoto, Japan, Japan
Conference Date: 22 June 1998
Volume: 1
ISBN (Paper): 0-7803-4538-X
DOI: 10.1109/IIT.1999.812195
Regular:

Wafer charge control has evolved from systems that add gas to the beam or extract electrons from an external source to systems that respond directly to beam potential and current density via an... View More

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